Chemical Vapor Deposition
Chemical Vapor Deposition can be described as growing diamonds from carbon-containing gas.
CVD process starts from the following: we put a diamond plate inside the vacuum chamber and heat this plate up to 800 ⁰C. Then the chamber is filled with carbon-rich gas (usually methane) which is also heated up to 3000 ⁰C with a microwave beam. It is done in order to break molecular bonds and release carbon atoms which are then deposited onto the diamond plate. Slowly but surely the diamond grows upwards (it's length and width are limited by the size of the plate). CVD requires 1-4 weeks from start to finish (depending on required weight).
Chemical Vapor Deposition, or CVD, is a highly controlled method used for the production of not only diamonds, but also optics and semiconductors. This process is a result of the utilization of ultra-pure carbon-rich gases within a specialized chamber. By heating the carbon-based gases, such as methane, the carbon atoms are separated from the gas and deposited onto a diamond substrate, resulting in the formation of a rough diamond crystal. This process is incredibly precise and can take anywhere from six to ten weeks to complete. The outcome of the CVD process is the production of gem-grade Type IIa diamonds, demonstrating the high yield and quality of the diamonds produced through this method.